文档摘要：绝缘子是电力系统主要绝缘设备之一,其绝缘性能影响着电网的安全稳定运行.增大爬电距离是提高绝缘子闪络电压的有效手段.然而在有限空间内增大爬电距离会使绝缘子结构复杂化,局部电弧在复杂的伞裙和伞棱间跳跃发展,会导致闪络电压不增反降.为探究绝缘子结构对电弧路径及闪络电压的影响规律,该文设计玻璃绝缘子试验模型并搭建电弧路径拍摄试验平台,研究绝缘子伞间空间深度和最大伞棱长度对绝缘子绝缘性能的影响.结果表明,绝缘子伞间电弧路径形式主要为沿面电弧和跃进电弧,受到结构参数的影响而呈现一定的概率分布;伞间空间深度系数(伞间距/伞伸出)建议值为0.8～1.2,过小则电弧跃进发展概率更高,过大则会导致空间利用率不足,均不利于提高绝缘子闪络电压;伞间最大伞棱长度系数(最大伞棱长度/伞间距)参考值为0.4～0.5,过大时对爬电距离的利用程度较低,造成闪络电压下降;此外,最大伞棱结构设置在伞裙边缘时相比于设置在伞裙内部的闪络电压更低.
Abstract：Insulatorsplayacrucialroleinpowersystemsastheyprovidesupportandinsulationforpowerlines.Whileinsulatorsaregenerallyresistanttointernalbreakdown,theyaremoresusceptibletoflashoversontheirexternalsurfaces.Inareaswithheavypollution,thepresenceofawaterfilmontheinsulator'ssurfaceincreasesthelikelihoodofpollutionflashover.Increasingthecreepagedistanceisthemosteffectivemethodforenhancingtheflashovervoltageofinsulators.However,increasingthecreepagedistancewithinalimitedspacecancomplicatetheinsulator'sstructure.Someinsulatorsfeaturemoreumbrellaribsinternally,whichcreatesacomplexandnarrowspacethatfacilitatesarcpropagationthroughjumping.Interestingly,largercreepagedistancescanleadtoadecreaseintheinsulator'sflashovervoltage.Toinvestigatethisphenomenon,thepaperfocusesonanalyzingthepathofarcpropagation,statisticalprobabilitydistribution,andtherelationshipbetweenarclengthandflashovervoltage.Firstly,aglassinsulatortestmodelwasdesignedtoreplicatetheactualinsulatorstructure.Thetestmodeltookintoconsiderationthreekeystructuralparametersoftheinsulator:umbrellaextension,umbrellaspacing,andmaximumumbrellariblength.Glasspanelswereusedasasubstitutefortherealinsulator'sumbrellaskirtsandribs.Byadjustingthelengthandwidthoftheglasspanels,itwaspossibletocreatetestmodelsthatmimickeddifferentinsulatorstructuresaccurately.Secondly,atestplatformforarcpathshootingwasconstructed.ThearcpathshootingplatformcomprisedapressurizedplatformdesignedtomeettheInternationalElectrotechnicalCommission(IEC)flashoverteststandardandahigh-speedcamera.Theinsulatortestmodelwassubjectedtomultipleflashovertests,whichinvolvedsmearingandvoltageapplicationfollowingtheproceduresoutlinedintheIECstandards.Finally,thehigh-speedcamerawascarefullypositionedtoalignwiththeverticalplanebetweentheinsulatorumbrellas.Thisenabledthecameratocapturethepathofthearcasitpropagatedacrosstheinsulator.Therecordedimagesweresubsequentlyprocessedusingimageprocessingtechniques,andthearcpathswerepreciselysegmentedusingmeshsegmentationalgorithms.Thismethodfacilitatedtheefficientandaccurateacquisitionofasubstantialvolumeofarcpathdata,enablingthegenerationofcomprehensivearcpathsummarycharts.Byemployingthisapproach,theresearcherswereabletogatherasignificantamountofdataonthearcpropagationpatternsacrosstheinsulator.Thisallowedfordetailedanalysisandevaluationoftheinfluenceofdifferentstructuralparametersoninsulationperformance.Twocoefficientrepresentationsareproposedtoevaluateinsulatorstructures.Thesecoefficientsincludethedepthcoefficientoftheinter-umbrellaspacedepth,whichiscalculatedbydividingtheumbrellaspacingbytheumbrellaextension,andthemaximumumbrellaribstructurecoefficient,obtainedbydividingtheumbrellariblengthbytheumbrellaspacing.Thefindingsofthestudyindicatethatthearcpathsbetweeninsulatorumbrellasmainlyfallintotwocategories:cling-surfacearcsandair-jumparcs.Theprobabilityofthesedifferentarcpathformationsisinfluencedbythestructuralparametersoftheinsulator.Basedontheresearchresults,itisrecommendedtomaintainaninter-umbrellaspacedepthcoefficient(umbrellaspacing/umbrellaextension)withintherangeof0.8～1.2.Asmallercoefficientleadstoahigherprobabilityofair-jumparcdevelopment,whereasalargercoefficientimpliesunder-utilizationoftheavailablespace.Furthermore,thestudysuggestsareferencerangeof0.4～0.5forthemaximumumbrellaribstructurecoefficient(umbrellariblength/umbrellaspacing).Whenthiscoefficientexceedstherecommendedrange,thecreepagedistanceisnotoptimallyutilized,resultinginreducedflashovervoltage.Thepaperhighlightsthatpositioningthemaximumumbrellaribattheedgeoftheumbrellaskirtresultsinlowerflashovervoltagecomparedtowhenitisplacedinsidetheskirt.
作者：宋治波 杨昊 申巍 肖康泰 薛建鹏 Author：SongZhibo YangHao ShenWei XiaoKangtai XueJianpeng
作者单位：西安工程大学电子信息学院西安710048国网陕西省电力有限公司电力科学研究院西安710100
刊名：电工技术学报 ISTICEIPKU
Journal：TransactionsofChinaElectrotechnicalSociety
年，卷(期)：2024, 39(13)
分类号：TM216
关键词：交流电压 绝缘子 污秽闪络 局部电弧 闪络电压
Keywords：ACvoltage insulator pollutionflashover partialarc flashovervoltage
机标分类号：TM85TM216TM773
在线出版日期：2024年7月22日
基金项目：国家自然科学基金，国网陕西省电力有限公司科技项目交流电压下伞型结构对染污绝缘子电弧路径及绝缘性能的影响[
期刊论文] 电工技术学报--2024, 39(13)宋治波 杨昊 申巍 肖康泰 薛建鹏绝缘子是电力系统主要绝缘设备之一,其绝缘性能影响着电网的安全稳定运行.增大爬电距离是提高绝缘子闪络电压的有效手段.然而在有限空间内增大爬电距离会使绝缘子结构复杂化,局部电弧在复杂的伞裙和伞棱间跳跃发展,会导...参考文献和引证文献
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关键词：交流电压,绝缘子,污秽闪络,局部电弧,闪络电压,
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